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Chemo Pads CMP-Series

Chemo pads comprise an open-pore polyurethane structure which is designed to an optimum chemical polishing, to allow, for example, silicon dioxide. Sometimes they also deliver optimal results with polishing media.

FPX2

ABRASIVES

CMP-Superfinish
diamond liquid

CHARACTERISTICS

smooth, embossed or structured surface
very suitable for processing of quartz, sapphire, silicon carbide, several crystals and semi-conductor technics
thickness 1,2 mm

FHC1

ABRASIVES

diamond liquid 0,1-1 μ
AI₂O₃ | SiO₂

CHARACTERISTICS

Buffered polyurethane
microscopic voids
laminated
hardness: 69 Shore-A
thickness: 1,5 mm

FKC7

ABRASIVES

colloidal suspension or aluminium

CHARACTERISTICS

chemically stabl
microporous PU pad
very good final polish
thickness: 1. 5 mm ±0. 05
hardness: 66 Shore-A
weight: 731 g/m²

Polishing pads

PU-Series

NW-Series

W-Series

F-Series