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Chemo Pads CMP-Series

Chemo pads comprise an open-pore polyurethane structure which is designed to an optimum chemical polishing, to allow, for example, silicon dioxide. Sometimes they also deliver optimal results with polishing media.

FPX2

ABRASIVES

  • CMP-Superfinish
  • diamond liquid

CHARACTERISTICS

  • smooth, embossed or structured surface
  • very suitable for processing of quartz, sapphire, silicon carbide, several crystals and semi-conductor technics
  • thickness 1,2 mm

FHC1

ABRASIVES

  • diamond liquid 0,1-1 μ
  • AI2O3 | SiO2

CHARACTERISTICS

  • Buffered polyurethane
  • microscopic voids
  • laminated
  • hardness: 69 Shore-A
  • thickness: 1,5 mm

FKC7

ABRASIVES

  • colloidal suspension or aluminium

CHARACTERISTICS

  • chemically stabl
  • microporous PU pad
  • very good final polish
  • thickness: 1. 5 mm ±0. 05
  • hardness: 66 Shore-A
  • weight: 731 g/m²

Polishing pads

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